MF067300 - SEMI MF673 - Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge Revision:SEMI MF673-0317 - Superseded The scope of this Document

The scope of this Document is limited to the definition of principles for handling reticles and other EES items within a specially designated controlled environment and recommendation of an appropriate level of electric field to maintain within that environment

replaced by SEMI C70)

This Standard specifies selected geometrical requirements of glass substrates used to manufacture flat panel displays

and scheduling and transport of the transfer unit

MF067300 - SEMI MF673 - Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge Revision:SEMI MF673-0317 - Superseded The scope of this DocumentResistivity is a primary quantity for characterization and specification of material used for semiconductor electronic devices. Sheet resistance is a primary quantity for characterization, specification, and monitoring of thin film fabrication processes. This Test Method outlines the principles of eddy current measurements as they relate to semiconductor substrates and certain thin films fabricated on such substrates as well as requirements for