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and determine the applicability of regulatory or other limitations prior to use
SEMI F33 — Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS)
It is an aqueous immersion method
This Test Method includes several methods for canceling gravity-induced deflection which could otherwise alter the shape of the wafer
M00300 - SEMI M3 - Specifications for Polished Monocrystalline Sapphire Substrates StdTpc-Process Chemicals - Acids and determine the applicability ofThis standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1978; previously published March 2004. NOTICE: This document was balloted and approved for withdrawal in 2007. Sapphire substrates are utilized for heteroepitaxial growth of silicon films for certain
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